FIBER OPTIC SEMICON TEMPERATURE MONITORING SOLUTIONS
Opsens’ Gallium Arsenide based technology fiber optic temperature sensors are ideal in providing accurate repeatable surface temperature measurements during semiconductor wafer manufacturing process in deposition chamber or RF Plasma etching.
Our robust fiber optic surface sensors, totally immune to RF and EMI, are not susceptible to fiber bending, fiber movements and optical connections hence providing high accuracy and reliable in situ temperature measurements on individual silicon-wafer. They are totally immune from most the conditions that adversely affect thermistors and thermocouples.
Our Temperature monitoring solutions are a must where uniformity across wafers is at risk. They are ideal for semiconductor and thin film processing where temperature is critical notably in plasma etching, post-exposure bake and deposition chambers (CVD, ALD, PVD, CMP and ECP).
- Wafer temperature monitoring
- Instrumented electrostatic chuck temperature monitoring
- Temperature monitoring for RF plasma etch process chambers
Opsens small sensing GaAs crystal located at the tip of the optical fber makes it convenient for tip measurement applications. Combined with Opsens’ SCBG signal conditioning technology and with the inherent advantages of fiber optic, the OTG-A delivers unprecedented repeatability and reliability in the most adverse conditions such as high level of EM, RF and high voltage.
The standard operating range of the OTGA is from -40 °C to +250 °C. Higher temperature ranges up to 350 °C are available upon request.
The OTG-P fiber optic temperature sensor is encapsulated in a rugged stainless steel tube (ceramic tube also available) for maximum protection in the most adverse handling conditions.
| MNT-G | OTG-A | MNT-G Multi | OTG-P |

